Gate Deposition Mask, High Density Design Type:Gate Deposition Mask - Interdigitated Channel HD OFETs Plus improved aerodynamics and mechanical

Plus improved aerodynamics and mechanical performance produce more uniform films

High Density Gate Deposition Mask

PhysRe Lett

Complete polarization of electronic spins in OLEDs

Soft-tipped probes Sharp-tipped probes Please note: Your Ossila Four-Point Probe will require screen firmware version 1

Gate Deposition Mask, High Density Design Type:Gate Deposition Mask - Interdigitated Channel HD OFETs Plus improved aerodynamics and mechanicalHigh Density Gate Deposition Mask Enabling accurate deposition resolution An evaporation mask for deposition of gate contacts, for use with the high density OFET system. A 100 m standoff spacer ensures that the mask does not touch the substrate while still enabling good deposition resolution. Mask with direct contact (no spacer): For sputtering and other non directional deposition systems, as well as for thermal deposition systems with oblique angles