PELCO® 35nm Silicon Nitride Support Films for TEM Rotated Celcon® (POM) - Excellent wear

Celcon® (POM) - Excellent wear resistance and resistance to most solvents and fuels - maximum temperature is 175°F (80°C)

5 Front Angle: 25 ± 5 Back Angle: 15 ± 5 Side Angle: 22

Excellent mechanical strength and toughness

The PELCO® Pro Superalloy

Included with MultiMode CAFM

PELCO® 35nm Silicon Nitride Support Films for TEM Rotated Celcon® (POM) - Excellent wearDESCRIPTION PRODUCT SPECIFICATIONS 35nm membrane thickness 25 apertures 200m frame thickness 21515 10 Silicon Nitride Support Film, 35nm, 70x70m Aperture (25) on 0. 5 x 0. 5mm Window pkg 10 Defining parameters for the PELCO Silicon Nitride Support Films are: Film Thickness: Resilient, ultra low stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;